multibeam-ebl-open

Open architecture multi-beam direct-write electron-beam lithography — Morin 2026 v5. CC BY 4.0 papers + MIT code. Sub-10 nm capable, ~$37M/tool vs EUV $200-400M, multi-vendor supply chain, no patent claims. (by robmorin0-hash)

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robmorin0-hash/multibeam-ebl-open is an open source project licensed under MIT License which is an OSI approved license.

The primary programming language of multibeam-ebl-open is TeX.


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